Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization.
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| Title: | Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization. |
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| Authors: | Poplata T; Institute for Coatings and Surface Chemistry, Department of Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 1, 47798, Krefeld, Germany., Wang Q; Institute for Coatings and Surface Chemistry, Department of Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 1, 47798, Krefeld, Germany., Allonas X; Laboratory of Macromolecular Photochemistry and Engineering, Université de Haute Alsace, 3b rue Alfred Werner, Mulhouse, 68093, France., Jäger M; Institute for Coatings and Surface Chemistry, Department of Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 1, 47798, Krefeld, Germany., Gutmann JS; Department of Physical Chemistry and Center of Nanointegration (CENIDE), University of Duisburg-Essen, Universitätsstr. 7, 45151, Essen, Germany., Dmitrieva E; Leibniz Institute for Solid State and Materials Research (IFW) Dresden, Helmholtzstr. 20, 01069, Dresden, Germany., Hartmann H; Faculty of Chemistry and Food Chemistry, Technical University Dresden, 01062, Dresden, Germany., Strehmel B; Institute for Coatings and Surface Chemistry, Department of Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 1, 47798, Krefeld, Germany. |
| Source: | Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2026 Jan 28; Vol. 65 (5), pp. e18608. Date of Electronic Publication: 2025 Dec 16. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 0370543 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3773 (Electronic) Linking ISSN: 14337851 NLM ISO Abbreviation: Angew Chem Int Ed Engl Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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