Interfacial Robustness in Fe2TiO5/ZnO Core-Shell Nanodendrites Revealed by STXM-Ptychography for Enhanced Photoelectrochemical Performance.

Saved in:
Bibliographic Details
Title: Interfacial Robustness in Fe2TiO5/ZnO Core-Shell Nanodendrites Revealed by STXM-Ptychography for Enhanced Photoelectrochemical Performance.
Authors: Das SC; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Chen KH; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Lin WX; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Wang HT; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Teng SA; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Dong CL; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Du CH; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Yeh PH; Department of Physics, Tamkang University, New Taipei City 251, Taiwan., Pao CW; National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan., Weng SC; National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan., Wang J; Canadian Light Source Inc., University of Saskatchewan, Saskatoon, Saskatchewan S7N 2V3, Canada., Ho WK; Department of Chemical Engineering, National Cheng Kung University, Tainan 701, Taiwan., Wu JJ; Department of Chemical Engineering, National Cheng Kung University, Tainan 701, Taiwan., Chiou JW; Department of Applied Physics, National University of Kaohsiung, Kaohsiung 811, Taiwan., Ray SC; Department of Physics, ITER, Siksha 'O' Anusandhan Deemed to be University, Bhubaneswar, Odisha 751 030, India.; Department of Physics, CSET, University of South Africa, Florida Park, Johannesburg 1710, South Africa., Pong WF; Department of Physics, Tamkang University, New Taipei City 251, Taiwan.
Source: ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2026 Jun 10; Vol. 18 (22), pp. 32011-32023. Date of Electronic Publication: 2026 May 26.
Publication Type: Journal Article
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
Description
ISSN:1944-8252
DOI:10.1021/acsami.6c03568