Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review.

Saved in:
Bibliographic Details
Title: Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review.
Authors: Kang M; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Kim S; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Go E; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Byun S; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Cho D; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea., Kim T; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea., Kang H; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; Eco-Friendly & Energy Machines, KIMM Campus, University of Science & Technology (UST), Daejeon 34113, Republic of Korea., Lee J; School of Mechanical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.; Center for Quantum Nanoscience, Institute for Basic Science (IBS), Seoul 03760, Republic of Korea., Ko M; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Jeon N; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Choi MS; Department of Materials Science and Engineering, Chungnam National University (CNU), Daejeon 34134, Republic of Korea., Kim HU; Semiconductor Manufacturing Research Center, Korea Institute of Machinery & Materials (KIMM), Daejeon 34103, Republic of Korea.; School of Mechanical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea.; Nano-Mechatronics, KIMM Campus, University of Science & Technology (UST), Daejeon 34113, Republic of Korea.
Source: ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2026 Jul 15; Vol. 18 (27), pp. 37378-37399. Date of Electronic Publication: 2026 Jun 24.
Publication Type: Journal Article; Review
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
Description
ISSN:1944-8252
DOI:10.1021/acsami.6c04768