Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.

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Bibliographic Details
Title: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.
Authors: Li, D.1, dyli@yzu.edu.cn, Goullet, A.2, Carette, M.3, Granier, A.2, Zhang, Y.1, Landesman, J.P.4
Source: Vacuum; Sep2016, Vol. 131, p231-239, 9p
Database: Applied Science & Technology Source
Description
ISSN:0042207X
DOI:10.1016/j.vacuum.2016.07.004