Performance and variability analysis of ALD-grown wafer scale HfO2/Ta2O5-based memristive devices for neuromorphic computing.

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Bibliographic Details
Title: Performance and variability analysis of ALD-grown wafer scale HfO2/Ta2O5-based memristive devices for neuromorphic computing.
Authors: Kumar, Sanjay1,2, sanjaysihag91@gmail.com, Yadav, Deepika1, Stathopoulos, Spyros1, Prodromakis, Themis1, sanjaysihag91@gmail.com
Source: Frontiers in Nanotechnology (2673-3013); 2025, p1-12, 12p
Database: Applied Science & Technology Source
Description
ISSN:26733013
DOI:10.3389/fnano.2025.1621554