View in EDS

Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films.

Saved in:
Bibliographic Details
Title: Temperature dependence of the biaxial modulus, intrinsic stress and composition of plasma deposited silicon oxynitride films.
Authors: Harding, David R., Ogbuji, Linus U. T., Freeman, Mathieu J.
Source: Journal of Applied Physics; August 1 1995, Vol. 78, p1673-1680, 8p
Database: Applied Science & Technology Source
Be the first to leave a comment!
You must be logged in first