Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering.
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| Title: | Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering. |
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| Authors: | Xirouchaki, C., Moschovis, K., Chatzitheodoridis, E., Kiriakidis, G., Morgen, P. |
| Source: | Applied Physics A: Materials Science & Processing. 1998, Vol. 67 Issue 3, p295. 7p. |
| Database: | Academic Search Ultimate |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 4720839 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Xirouchaki%2C+C%2E%22">Xirouchaki, C.</searchLink><br /><searchLink fieldCode="AR" term="%22Moschovis%2C+K%2E%22">Moschovis, K.</searchLink><br /><searchLink fieldCode="AR" term="%22Chatzitheodoridis%2C+E%2E%22">Chatzitheodoridis, E.</searchLink><br /><searchLink fieldCode="AR" term="%22Kiriakidis%2C+G%2E%22">Kiriakidis, G.</searchLink><br /><searchLink fieldCode="AR" term="%22Morgen%2C+P%2E%22">Morgen, P.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. 1998, Vol. 67 Issue 3, p295. 7p. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=4720839 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s003390050774 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 7 StartPage: 295 Titles: – TitleFull: Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Xirouchaki, C. – PersonEntity: Name: NameFull: Moschovis, K. – PersonEntity: Name: NameFull: Chatzitheodoridis, E. – PersonEntity: Name: NameFull: Kiriakidis, G. – PersonEntity: Name: NameFull: Morgen, P. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: 1998 Type: published Y: 1998 Identifiers: – Type: issn-print Value: 09478396 Numbering: – Type: volume Value: 67 – Type: issue Value: 3 Titles: – TitleFull: Applied Physics A: Materials Science & Processing Type: main |
| ResultId | 1 |