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Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.

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Title: Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.
Authors: Assfour, Bassem1 (AUTHOR) bassfour@aec.org.sy, Abdallah, Bassam2 (AUTHOR), Allaf, Abdul Wahab1 (AUTHOR), Kakhia, Mahmoud2 (AUTHOR)
Source: Inorganic Chemistry Communications. Jun2025, Vol. 176, pN.PAG-N.PAG. 1p.
Subjects: Nickel-chromium alloys, DC sputtering, Silicon steel, Contact angle, Thin film deposition
Abstract: [Display omitted] • Ni–Cr–Mo films deposited on steel and silicon using DC sputtering. • Higher power increases Cr and Mo in films. • More Cr and Mo enhances hydrophobicity and corrosion resistance. • Films are suitable for dental implants. Our study uniquely explores the function of DC magnetron sputtering power in enhancing the deposition of Ni–Cr–Mo thin films for dental implant applications. Films deposited on 304 stainless steel and silicon substrates (70–100 W) exhibited power-dependent structural and compositional changes, directly linked to enhanced performance. Increasing sputtering power to 100 W elevated Cr/Mo content by ∼10 % and reduced corrosion rate by 40 % compared to 70 W, while contact angles surpassed 98°, achieving hydrophobicity. These improvements stem from denser morphologies and preferential deposition of passivating elements (Cr/Mo), as confirmed by XRD and SEM-EDX. In contrast to previous studies concerning mainly bulk alloy properties, this study establishes a direct process-property relationship for thin film coatings enabling precise control for corrosion resistance and surface wettability as key players to improve implant longevity in biological settings. Therefore, by establishing the correlation between sputtering parameters and electrochemical stability, the present study enhances the design of durable, bioinert coatings, thereby providing a scalable strategy to optimize dental implant materials. [ABSTRACT FROM AUTHOR]
Copyright of Inorganic Chemistry Communications is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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An: 184229727
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  Data: Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.
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  Data: <searchLink fieldCode="AR" term="%22Assfour%2C+Bassem%22">Assfour, Bassem</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> bassfour@aec.org.sy</i><br /><searchLink fieldCode="AR" term="%22Abdallah%2C+Bassam%22">Abdallah, Bassam</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Allaf%2C+Abdul+Wahab%22">Allaf, Abdul Wahab</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kakhia%2C+Mahmoud%22">Kakhia, Mahmoud</searchLink><relatesTo>2</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Inorganic+Chemistry+Communications%22">Inorganic Chemistry Communications</searchLink>. Jun2025, Vol. 176, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Nickel-chromium+alloys%22">Nickel-chromium alloys</searchLink><br /><searchLink fieldCode="DE" term="%22DC+sputtering%22">DC sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+steel%22">Silicon steel</searchLink><br /><searchLink fieldCode="DE" term="%22Contact+angle%22">Contact angle</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+film+deposition%22">Thin film deposition</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: [Display omitted] • Ni–Cr–Mo films deposited on steel and silicon using DC sputtering. • Higher power increases Cr and Mo in films. • More Cr and Mo enhances hydrophobicity and corrosion resistance. • Films are suitable for dental implants. Our study uniquely explores the function of DC magnetron sputtering power in enhancing the deposition of Ni–Cr–Mo thin films for dental implant applications. Films deposited on 304 stainless steel and silicon substrates (70–100 W) exhibited power-dependent structural and compositional changes, directly linked to enhanced performance. Increasing sputtering power to 100 W elevated Cr/Mo content by ∼10 % and reduced corrosion rate by 40 % compared to 70 W, while contact angles surpassed 98°, achieving hydrophobicity. These improvements stem from denser morphologies and preferential deposition of passivating elements (Cr/Mo), as confirmed by XRD and SEM-EDX. In contrast to previous studies concerning mainly bulk alloy properties, this study establishes a direct process-property relationship for thin film coatings enabling precise control for corrosion resistance and surface wettability as key players to improve implant longevity in biological settings. Therefore, by establishing the correlation between sputtering parameters and electrochemical stability, the present study enhances the design of durable, bioinert coatings, thereby providing a scalable strategy to optimize dental implant materials. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Inorganic Chemistry Communications is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1016/j.inoche.2025.114304
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Nickel-chromium alloys
        Type: general
      – SubjectFull: DC sputtering
        Type: general
      – SubjectFull: Silicon steel
        Type: general
      – SubjectFull: Contact angle
        Type: general
      – SubjectFull: Thin film deposition
        Type: general
    Titles:
      – TitleFull: Effect of sputtering power on the structure and corrosion properties of DC magnetron sputtered Ni–Cr–Mo thin films.
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            NameFull: Assfour, Bassem
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            NameFull: Abdallah, Bassam
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            NameFull: Allaf, Abdul Wahab
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            NameFull: Kakhia, Mahmoud
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          Dates:
            – D: 01
              M: 06
              Text: Jun2025
              Type: published
              Y: 2025
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              Value: 176
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            – TitleFull: Inorganic Chemistry Communications
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