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Confocal two photon emission microscopy: A new approach to waveguide imaging

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Bibliographic Details
Title:	Confocal two photon emission microscopy: A new approach to waveguide imaging
Authors:	Dierolf, V. vod2@lehigh.edu, Sandmann, C.¹
Source:	Journal of Luminescence. May2003, Vol. 102-103, p201. 5p.
Subjects:	Confocal microscopy, Integrated optics, Waveguides
Abstract:	Based on earlier studies of the interaction effects between Er3+ and Ti4+ ions in Ti:LiNbO3 waveguides we investigated the feasibility of using the Er3+ as a sensitive probe to determine Ti4+-diffusion profiles with high spatial resolution. Using a home-built confocal microscope combined with site-selective optical spectroscopy we tested two different operation modes: (i) Evaluating the emission spectra obtained by one-step excitation with a single laser we obtain high resolution (≈700 nm) Ti4+-concentration images. In particular using the second moments of the spectra, which turn out to be approximately linearly related to the Ti4+-concentration, we obtain very good contrast with essentially no artifacts caused by topology, intensity fluctuations, and Er3+ ion concentration profile. (ii) Measuring the total emission intensity under a specially chosen two step excitation scheme allows to selectively excite regions with a certain Ti4+ concentration. While for (i) a calibration can be done, for (ii) this will be hard due to the multi-site character of the Er3+ in LiNbO3. [Copyright &y& Elsevier]
	Copyright of Journal of Luminescence is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database:	Engineering Source

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