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Visualizing Ferroelectric Uniformity of Hf1-xZrxO2 Films Using X-ray Mapping.

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Title: Visualizing Ferroelectric Uniformity of Hf1-xZrxO2 Films Using X-ray Mapping.
Authors: Chang SJ; International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan., Teng CY; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan., Lin YJ; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan., Wu TM; Department of Electro-physics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan., Lee MH; Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 10610, Taiwan., Lin BH; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan., Tang MT; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan., Wu TS; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan., Hu C; International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States., Tang EY; Taiwan Semiconductor Research Institute, Hsinchu 30010, Taiwan., Tseng YC; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
Source: ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2021 Jun 23; Vol. 13 (24), pp. 29212-29221. Date of Electronic Publication: 2021 Jun 13.
Publication Type: Journal Article
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Visualizing Ferroelectric Uniformity of Hf<subscript>1-x</subscript>Zr<subscript>x</subscript>O<subscript>2</subscript> Films Using X-ray Mapping.
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  Data: <searchLink fieldCode="AU" term="%22Chang+SJ%22">Chang SJ</searchLink>; International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.<br /><searchLink fieldCode="AU" term="%22Teng+CY%22">Teng CY</searchLink>; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.<br /><searchLink fieldCode="AU" term="%22Lin+YJ%22">Lin YJ</searchLink>; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.<br /><searchLink fieldCode="AU" term="%22Wu+TM%22">Wu TM</searchLink>; Department of Electro-physics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.<br /><searchLink fieldCode="AU" term="%22Lee+MH%22">Lee MH</searchLink>; Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 10610, Taiwan.<br /><searchLink fieldCode="AU" term="%22Lin+BH%22">Lin BH</searchLink>; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan.<br /><searchLink fieldCode="AU" term="%22Tang+MT%22">Tang MT</searchLink>; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan.<br /><searchLink fieldCode="AU" term="%22Wu+TS%22">Wu TS</searchLink>; National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan.<br /><searchLink fieldCode="AU" term="%22Hu+C%22">Hu C</searchLink>; International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.<br /><searchLink fieldCode="AU" term="%22Tang+EY%22">Tang EY</searchLink>; Taiwan Semiconductor Research Institute, Hsinchu 30010, Taiwan.<br /><searchLink fieldCode="AU" term="%22Tseng+YC%22">Tseng YC</searchLink>; Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
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  Data: <searchLink fieldCode="JN" term="%22101504991%22">ACS applied materials & interfaces</searchLink> [ACS Appl Mater Interfaces] 2021 Jun 23; Vol. 13 (24), pp. 29212-29221. <i>Date of Electronic Publication: </i>2021 Jun 13.
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Chemical+Society%22">American Chemical Society </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>101504991 <i>Publication Model: </i>Print-Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1944-8252 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2219448244%22">19448244 </searchLink><i>NLM ISO Abbreviation: </i>ACS Appl Mater Interfaces <i>Subsets: </i>MEDLINE; PubMed not MEDLINE
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=34121385
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        Value: 10.1021/acsami.1c08265
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      – Code: eng
        Text: English
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        StartPage: 29212
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      – TitleFull: Visualizing Ferroelectric Uniformity of Hf1-xZrxO2 Films Using X-ray Mapping.
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            – D: 23
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              Text: 2021 Jun 23
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              Y: 2021
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