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Stability of electron ptychography at low electron dose.

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Title: Stability of electron ptychography at low electron dose.
Authors: Dearg M; School of Physics, Engineering and Technology, University of York, York, UK., Michaelides N; School of Physics, Engineering and Technology, University of York, York, UK., Gilbert J; School of Physics, Engineering and Technology, University of York, York, UK., Ding Z; Department of Materials, University of Oxford, Oxford, UK., Aslam Z; Leeds Electron Microscopy And Spectroscopy Centre (LEMAS), The Bragg Centre for Materials Research, Faculty of Engineering and Physical Sciences, University of Leeds, Leeds, UK., Hopkinson DG; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK., Allen CS; Department of Materials, University of Oxford, Oxford, UK.; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK., Clark L; School of Physics, Engineering and Technology, University of York, York, UK.
Source: Journal of microscopy [J Microsc] 2025 Nov; Vol. 300 (2), pp. 217-226. Date of Electronic Publication: 2025 Jul 26.
Publication Type: Journal Article
Journal Info: Publisher: Published for the Royal Microscopical Society by Blackwell Scientific Publications Country of Publication: England NLM ID: 0204522 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1365-2818 (Electronic) Linking ISSN: 00222720 NLM ISO Abbreviation: J Microsc Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Data: Stability of electron ptychography at low electron dose.
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  Data: <searchLink fieldCode="AU" term="%22Dearg+M%22">Dearg M</searchLink>; School of Physics, Engineering and Technology, University of York, York, UK.<br /><searchLink fieldCode="AU" term="%22Michaelides+N%22">Michaelides N</searchLink>; School of Physics, Engineering and Technology, University of York, York, UK.<br /><searchLink fieldCode="AU" term="%22Gilbert+J%22">Gilbert J</searchLink>; School of Physics, Engineering and Technology, University of York, York, UK.<br /><searchLink fieldCode="AU" term="%22Ding+Z%22">Ding Z</searchLink>; Department of Materials, University of Oxford, Oxford, UK.<br /><searchLink fieldCode="AU" term="%22Aslam+Z%22">Aslam Z</searchLink>; Leeds Electron Microscopy And Spectroscopy Centre (LEMAS), The Bragg Centre for Materials Research, Faculty of Engineering and Physical Sciences, University of Leeds, Leeds, UK.<br /><searchLink fieldCode="AU" term="%22Hopkinson+DG%22">Hopkinson DG</searchLink>; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK.<br /><searchLink fieldCode="AU" term="%22Allen+CS%22">Allen CS</searchLink>; Department of Materials, University of Oxford, Oxford, UK.; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK.<br /><searchLink fieldCode="AU" term="%22Clark+L%22">Clark L</searchLink>; School of Physics, Engineering and Technology, University of York, York, UK.
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  Data: <searchLink fieldCode="JN" term="%220204522%22">Journal of microscopy</searchLink> [J Microsc] 2025 Nov; Vol. 300 (2), pp. 217-226. <i>Date of Electronic Publication: </i>2025 Jul 26.
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        Value: 10.1111/jmi.70011
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      – TitleFull: Stability of electron ptychography at low electron dose.
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              Text: 2025 Nov
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